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Centimeter-sized single-crystalline graphene is obtained by an oxidative-etching-assisted chemical vapor deposition (CVD) method. Gaseous oxidants are found to be highly responsible for graphene etching. By diminishing the uncertain amount of H2 O vapor in commercial H2 and precisely introducing additional O2 , the graphene nucleation density can be well controlled.
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Guo et al. (2016) studied this question.
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