Aerosol‐assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag1−xPdx, Ag1−xCux and Pd1−xCux) Films

Thermally labile, low‐volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high‐quality metal films. Here, a new method, aerosol‐assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors. magnified image