Electron transport in granular amorphous silicon dioxide films with ferromagnetic nanoparticles placed in a magnetic field

Electron transport in amorphous silicon dioxide films with embedded nanoparticles (Co, Nb, Ta) was studied. The mean number of localized states in the interparticle tunneling channel was derived from the temperature dependence of conductivity for various grain concentrations under the assumption of the electron transport being governed by resonance tunneling in a chain of localized states between grains. To confirm the assumption of the inelastic character of tunneling, the dependences of the magnetoresistance on grain concentration, temperature, and magnetic field were studied. Accepting the single-orbital model, where the intergrain tunneling magnetoresistance is determined by s - s tunneling, it was found that the existence of weakly split localized states in the tunneling channel results in a lack of magnetoresistance saturation in strong magnetic fields. The combined effect of a decrease in the s - s tunneling coefficient and of growth in the probability of inelastic electron spin scattering with increasing length of the chain of localized states between particles in which the electron is tunneling accounts for the characteristic temperature-concentration dependences of the magnetoresistance. The experimental observation of these features provides an argument for the electron transport in a -SiO 2 (Co,Nb,Ta) structures being governed by inelastic resonance tunneling through intergrain localized states.