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March 20, 1998Applied Optics

Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography

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Authors

MMMalcolm W. McGeochLaser Operations (United States)

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Malcolm W. McGeoch (1998) studied this question.

synapsesocial.com/papers/6ab5f2f47e2508a9a6fb819dhttps://doi.org/10.1364/ao.37.001651
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Stability enhancement of a low initial density hollow gas-puff z pinch by e− beam preionization1987 · 48 citations
  2. 2X-ray lithography using a pulsed plasma source1981 · 62 citations
  3. 3Homogeneous cylindrical plasma source for short-wavelength laser experiments1991 · 17 citations
  4. 4Soft x-ray spectra from a gas-puff z pinch1989 · 7 citations
  5. 5Extreme ultraviolet emission from gas puff plasmas1983 · 8 citations