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A simulation model for chemical amplification resists is proposed. This model includes a bulk acid loss reaction and an acid diffusion, as well as a crosslinking reaction. Good agreement with experimental patterns was achieved only when these reactions were calculated self-consistently. The calculation revealed that, for designing chemical amplification resists, one of the key factors is the crosslinking reaction sensitivity to post-exposure bake (PEB) temperature. However, in quarter-micron pattern formation, the acid diffusion was found to significantly affect pattern profile as well as the crosslinking reaction dose.
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Yoshino et al. (1992) studied this question.
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