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January 1, 1996Langmuir

A Monolayer-Based Lift-Off Process for Patterning Chemical Vapor Deposition Copper Thin Films

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Authors

NJNoo Li JeonSeoul National UniversityPCPaul G. ClemSandia National LaboratoriesDPDavid A. PayneNorthwestern University

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Cite This Study

Jeon et al. (1996) studied this question.

synapsesocial.com/papers/6ab63ec7baea7a66446fe22dhttps://doi.org/10.1021/la960377b
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