Deposition of lanthanum zirconium oxide high-κ films by liquid injection atomic layer deposition

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Thin films of lanthanum zirconium oxide, LaxZr1−xO2−δ (x=0.22,0.35,0.63), have been grown by liquid injection atomic layer deposition using [(PriCp)3La] and [(MeCp)2ZrMe(OMe)] precursors. At lower La atomic fractions (x=0.22) films were stabilized in the cubic phase after annealing at 700°C in air. At higher La atomic fractions (x>0.35), the films remained amorphous after annealing. The films deposited showed good dielectric properties with low hysteresis voltages and negligible flatband voltage shifts. The relative permittivity (κ) ranged from 11 to 14 with leakage current densities at 1MVcm−1 in the range of 2.6×10−6–5.3×10−7Acm−2.