A double RESURF LDMOS with drain profile engineering for improved ESD robustness

This letter reports a novel 50 V lateral power MOSFET structure that is self-protecting with respect to electrostatic discharge (ESD) strikes. This device features a double RESURF technique in conjunction with a deep drain engineered profile that eliminates soft leakage degradation after snapback, thus demonstrating immunity to filamentation. Maximum second breakdown current (I/sub t2/) of 16 mA/μm has been realized in a 100 ns transmission line pulse (TLP) measurement even with a higher holding voltage of 20 V. ESD protection level in excess of 5 kV with an equivalent human body model (HBM) has been shown to be feasible for this device without significant compromise in device size.