Synthesis and Radical Polymerization of 2-Allyl Oxycarbonyl p-Cyclopropyl Styrene and Its Properties

Allyl ether—2-allyl oxycarbonyl p-cyclopropyl styrene was synthesized and subjected to radical homopolymerization. Photosensitivity of synthesized polymer, which contains UV-sensitive allyl and cyclopropane ring fragments in its macromolecule, was studied. Photochemical structuring was studied, and it was established that the synthesized polymer is photosensitivity and can be used to create a photosensitive material. Polymer structure was established using IR and PMR spectroscopy (proton magnetic resonance). Gas-liquid chromatography showed that the synthesized allyl ether purity was approximately 99.3%. Homopolymerization of 2-allyl oxycarbonyl p-cyclopropyl styrene was carried out in the presence of dinitrilazino isobutyric acid. Physicochemical parameters of polymerization product of synthesized 2-allyl oxycarbonyl p‑cyclopropyl styrene were studied, and it was shown that this polymer exhibits high physicomechanical properties. It was found that upon transition from monomer to polymer, the allyl moiety remains virtually unchanged. This fact indicates that radical polymerization occurs through the reaction of the monomer’s vinyl double bond. Under the chosen conditions, the allyl moiety is virtually uninvolved in the polymerization process. As a result of this study, a new cyclopropane-containing monomer was synthesized, and its radical polymerization patterns were studied using it.