We investigate the amorphous thin-film growth of SiO2 and Nb2O5 on glass substrates and quantify the roughness of the film surface by means of a statistical data analysis of atomic force microscopy images. We determine the absolute root-mean-square roughness, the effective growth exponent β, the local roughness exponent α, and the evolution of the lateral correlation length ξa for dual magnetron sputter-deposited thin films.
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Elsholz et al. (2005) studied this question.
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