Three-Component Negative-Type Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator

A negative-working photoresist based on calix[4]resorcinarene (C-4-RA), 4,4‘-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a cross-linker, and a photoacid generator diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) has been developed. A clear transparent film was obtained from a 25 wt % C-4-RA solution in 2-methoxyethanol. The photoresist consisting of C-4-RA (65 wt %), MBHP (25 wt %), and DIAS (10 wt %) showed a sensitivity of 4.3 mJ/cm 2 and a contrast of 2.9 when it was exposed to 365 nm light and postbaked at 120 °C for 3 min, followed by developing with a 0.1% aqueous tetramethylammonium hydroxide solution at room temperature. The mechanistic study on the formation of images is also discussed.