A lithographic process is described which increases the sensitivity of polymers to electron beam irradiation. The free radicals and peroxides produced in a film of polymer by irradiation are used to initiate the grafting of a monomer to form a graft copolymer, the solubility of which may be higher or lower than that of the initial polymer. Acrylic acid has been grafted into poly(methyl methacrylate) films to produce a copolymer which is insoluble in the solvents of PMMA. The sensitivity of this negative system depends on the conditions of grafting and on the conditions of development. A sensitivity of 2.8 10−8 C.cm−2 at 20 keV has been obtained.
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Gazard et al. (1980) studied this question.
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