Three‐dimensional processing is a key trend in micro/nano manufacturing, with widespread applications in photonics, manufacturing, and optical storage. However, simultaneously achieving high fabrication resolution, throughput, and quality for three‐dimensional structures remains challenging. Here, we propose a three‐dimensional multi‐foci light‐field shaping and high‐throughput micro/nano manufacturing method based on a single pulse. This method combines a multi‐layer noise threshold filtering algorithm with a multi‐layer over‐sampling algorithm to generate a three‐dimensional multi‐foci light field with up to 5,400 laser foci across six layers using a dual‐spatial‐light‐modulator parallel system. In processing experiments, a representative single‐spatial‐light‐modulator light field contains 1,200 laser foci per pulse. Under the dual‐spatial‐light‐modulator parallel system, this configuration corresponds to 2,400 processing points per incident pulse, enabling a demonstrated processing throughput of 24 000 000 processing points s −1 . In addition, the method achieves an isolated smallest feature of approximately 50 nm and demonstrates high manufacturing flexibility and broad material compatibility across inorganic, organic, and hydrogel materials. This strategy provides a precise, scalable, and efficient route for high‐quality three‐dimensional micro/nano manufacturing.
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Wu et al. (2026) studied this question.
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