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Literature data on methods for synthesizing hexafluoroethane, a gaseous fluorine carrier used for silicon etching in the semiconductor industry, are summarized: catalytic fluorination of chlorofluorocarbons with hydrogen fluoride; fluorination of ethane, ethylene, fluoroethanes, fluoroethylenes, chlorofluoroethanes, and chlorofluoroethylenes with fluorine, variable-valence metal fluorides, and uranium hexafluoride; fluorination of carbon with fluorine; pyrolysis of perfluorocarbons; electrochemical methods. The advantages and disadvantages of these methods are outlined. Methods for purifying hexafluoroethane from impurities formed during synthesis are also considered: decantation, neutralization, rectification, adsorption, and others. Methods for analyzing the composition of hexafluoroethane are described, including gas chromatography, spectral methods, and determination of gas moisture and acidity.
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Sadikova et al. (2025) studied this question.
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