New flattening technique of iron garnet films by laser etching

A new flattening technique was found through a study of the acceleration of the chemical etching process of iron garnet films by laser irradiation. The films on Gd3Ga5O12 substrates immersed in phosphoric acid were etched by irradiation with a laser beam of 581-nm wavelength. Regardless of the initial film thickness, the etching practically terminated when the thickness reached a certain magnitude. By using this phenomenon, we succeeded in flattening the film and integrating multiple different films on a single substrate.