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We propose a transition state for oxygen in silica. This state is produced by the insertion of an oxygen molecule into the Si--O--Si bond, i.e., it consists of producing a Si--O--O--O--Si bond. This state allows molecular oxygen diffusion in silica without breaking the molecular O₂ bond and it is energetically more stable than a peroxy configuration. This configuration may allow for exchange of molecular oxygen with the oxygen in the silica framework.
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Chelikowsky et al. (2000) studied this question.
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