Gas-jet deposition of diamond coatings with activation of precursor gases by microwave discharge: features, possibilities, and prospects

A gas-jet method for depositing diamond coatings with gas activation by a microwave discharge is considered. A distinctive feature of this method is the use of a high-speed jet to transport gases activated in microwave plasma in the discharge chamber to a substrate located in the deposition chamber. This approach opens up new possibilities in the field of gas-phase diamond synthesis, but the development of this method requires systematic research. The effectiveness of this method is demonstrated. The success of the study is due to a systematic numerical and experimental study of individual processes involved in the gas-jet synthesis of diamond coatings.