We report the wet etch rate difference and device impact between pure metal Molybdenum and metal-nitride complex Molybdenum Nitride and Titanium Nitride. We discuss the wet etch results of acidic and alkaline solutions without oxidant to Molybdenum. We report that Molybdenum can be etched by ozonated water with different concentrations. Finally, we demonstrate p-type work function metal Mo patterning with ozonated water on Ring Oscillator device.
No takes yet. Share an insight, caveat, or question.
Lai et al. (2026) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: