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Semiconductor manufacturing relies on specialized yellow lighting in lithography fabs to reduce photoresist degradation, but the spectral characteristics of such lighting also motivate evaluation of its effects on human-related responses. This study evaluates whether candlelight-style LED illumination can serve as an alternative lighting condition while maintaining photoresist compatibility. We compare the two lighting conditions across fabrication-related measurements, spectral calculations, questionnaire responses, concentration maintenance, viewing clarity, and intraocular pressure. The results include a smaller increase in photoresist viscosity under an accelerated exposure test, differences in calculated MPE and MSS values, descriptive differences in questionnaire responses, concentration-maintenance trends, and visual-response measurements. Because several outcomes are descriptive or modeled and some experimental details could not be independently verified from the retained records, the findings are interpreted cautiously.
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Sharma et al. (2026) studied this question.
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