Impact of ultra-thin titanium film thickness on titanium silicides: specific contact resistivity and thermal stability

Key Points

• Contact resistivity decreases with increased titanium film thickness, enhancing electrical performance.
• The thermal stability of titanium silicides shows variation based on the film thickness, crucial for device reliability.
• Assessment focused on ultra-thin titanium films and their effects on silicon, using controlled experimental techniques.
• Findings suggest optimizing titanium film parameters may improve electronic device efficiency and longevity.