Research demonstrates reduced shear bond strength in etch-and-rinse adhesives with UV light exposure, highlighting implications for dental applications.
Background: In adhesive dentistry, debonding-on-demand is attractive for situations where no permanent attachment is required. Due to its destructive nature, ultraviolet (UV) light may be of interest for attenuating bond forces. The aim of this study was to investigate the impact of UV light on the shear bond strength (SBS) of etch-and-rinse (n = 4) and universal adhesives (n = 3). Methods: Glass-ceramic samples were bonded to bovine enamel surfaces (n = 10/adhesive) and subjected to shear bond testing before and after exposure to UV light (320–390 nm, 126 Jcm−2). Data was statistically analyzed by Mann–Whitney U test. Results: Initial photopolymerized etch-and-rinse adhesives showed superior SBS compared to universal adhesives. Highest values were recorded for iBOND® Total etch (15.48 MPa) and Syntac classic© (17.60 MPa). Lowest SBS was obtained for Ecosite Bond® (2.63 MPa). Additional UV exposure caused a significant decrease in SBS among iBOND Total etch (5.24 MPa, p = 0.009) and Solobond M© (3.65 MPa, p = 0.005), while for Syntac classic©, an increase (24.12 MPa, p = 0.047) was recorded. Among all other tested adhesives, no significant changes were observed. Conclusions: UV radiation impacted SBS of etch-and-rinse adhesives only (decrease: iBOND Total Etch, Solobond M; enhancement: Syntac classic©). Further research should focus on introducing sufficient light-triggered debonding mechanisms.
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Heyder et al. (2025) studied this question.
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