Influence of the Ti Content in WO₃ Nanorod Films Prepared by Oblique Angle Deposition in Sputtering Technique on the Electrochromic Properties

In this work, the effects of Ti content on the electrochromic properties of TiWO 3 films are investigated. These films with a nanorod structure are prepared by oblique angle deposition (OAD) in the sputtering process. Sputtered films with a thickness of 100 nm of W and W: Ti for ratios of 5:95 and 50:50 wt.% are thermally oxidized at 500 °C for 1 h. The WO 3 nanorod films exhibit a clear crystalline structure, whereas the TiWO 3 nanorod films show decreased crystallinity, retaining the crystalline structure of WO 3 . Moreover, the TiO 2 phase appeared in the presence of W: Ti is 50:50 wt.%. The thermally oxidized films show a clear grain cluster‐forming surface. The WO 3 nanorod films exhibit the highest optical contrast of 0.485 with a coloration efficiency of 10.129% and superior electrochromic performance compared to TiWO 3 nanorod films. Meanwhile, the TW5 films reveal a significant increase in the CV loop, demonstrating the most effective test cycle for electrochromic applications.