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September 10, 2025Scientific Research JournalOpen Access

Effect of Deposition Temperature on The Structural and Crystallinity Properties of Self-Catalyzed Growth Indium Tin Oxide (ITO) Thin Film Using CVD Technique

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Authors

MYMuchammad YunusAirlangga University ASAzianty Saroni

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Implication

Investigation shows deposition temperature affects structural and crystallinity properties in ITO thin films, indicating optimal conditions for performance.

Key Points

The optimal deposition temperature for ITO thin films was found to be 1100 °C, enhancing crystallinity and structure.
SEM analysis revealed well-defined shapes and minimal aggregation at 1100 °C, with an average diameter of 0.46 μm.
Crystallite size increased from 35.21 nm to 103.05 nm when the temperature was raised from 1000 °C to 1200 °C.
Results highlight the critical role of deposition temperature in achieving desired structural properties for optoelectronic applications.

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Yunus et al. (2025) studied this question.

synapsesocial.com/papers/68c183f09b7b07f3a060fa50 https://doi.org/10.24191/srj.v22i2.23000

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Implication

Investigation shows deposition temperature affects structural and crystallinity properties in ITO thin films, indicating optimal conditions for performance.

Effect of Deposition Temperature on The Structural and Crystallinity Properties of Self-Catalyzed Growth Indium Tin Oxide (ITO) Thin Film Using CVD Technique

Discussion

Member takes

Implication

Key Points

Cite This Study

Effect of Deposition Temperature on The Structural and Crystallinity Properties of Self-Catalyzed Growth Indium Tin Oxide (ITO) Thin Film Using CVD Technique

Discussion

Member takes

Implication

Key Points

Cite This Study

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