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September 10, 2025International Journal of Science and Research Archive

Structural Properties of Indium Tin Oxide (ITO) Deposited Thin Film Using Electron Beam Evaporation

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Authors

FSFaruk SaniAkamai (United States)HYHafizal Yahaya

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Implication

This research shows the structural characteristics of indium tin oxide thin films deposited via electron beam evaporation, indicating potential in optoelectronic applications.

Key Points

ITO thin films exhibit a crystalline structure that improves as thickness increases, enhancing material quality.
X-ray diffraction revealed that larger nanoparticle sizes were obtained at peak angles, demonstrating growth trends with thickness.
Samples showed significant variation in nanoparticle size, with the 170 nm ITO film exhibiting the largest size at 56.28 nm.
These findings highlight the potential of ITO thin films in optoelectronic and photovoltaic applications, calling for further exploration.

Cite This Study

Sani et al. (2025) studied this question.

synapsesocial.com/papers/68c1a5f854b1d3bfb60dfc1f https://doi.org/10.30574/ijsra.2025.16.1.2220

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Implication

This research shows the structural characteristics of indium tin oxide thin films deposited via electron beam evaporation, indicating potential in optoelectronic applications.

Structural Properties of Indium Tin Oxide (ITO) Deposited Thin Film Using Electron Beam Evaporation

Discussion

Member takes

Implication

Key Points

Cite This Study

Structural Properties of Indium Tin Oxide (ITO) Deposited Thin Film Using Electron Beam Evaporation

Discussion

Member takes

Implication

Key Points

Cite This Study

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