Impact of Deposition Temperature on Indium Trioxide's Structural and Optical Properties

This study examined how altering the deposition temperature affected the characteristics of the indium oxide thin (In2O3) films that were produced. using silicon bases and the pulsed laser deposition (PLD) technique. In2O3 films (nanoparticles) were prepared by the PLD method utilizing a 1064 nm wavelength (Nd:YAG) laser. Atomic force microscopy, UV-visible spectroscopy, Field Emission Scanning Electron Microscopy (FE-SEM), and x-ray diffraction (XRD) were used to describe the sample. The films' polycrystalline structure was demonstrated by the X-ray diffraction pattern data. image of a microscope Atomic force microscopy (AFM) analysis showed that the films made using the PLD process had a homogenous surface, and UV-visible spectroscopy revealed that spherical nanoparticles with altered optical characteristics emerge when the temperature of deposition changes. The produced films' absorbance, transmittance, and energy gap spectra, which were examined in relation to their optical characteristics, were 3.91 eV at 300 C.