Taguchi Optimization of Corrosion Resistance and Wettability of a-C Films on SS316L Deposited via Magnetron Sputtering Technique

Due to the exceptional corrosion resistance, chemical stability, and dense microstructure, carbon-based thin films are extensively employed in hydrogen energy systems. This study employed magnetron sputtering to fabricate amorphous carbon (a-C) films on SS316L substrates, aiming to improve the corrosion resistance of bipolar plates (BPs) in proton exchange membrane fuel cells (PEMFCs). Using a Taguchi design, the effects of working pressure, sputtering power, substrate bias, and deposition time on film properties were systematically examined and optimized. Films were examined via field emission scanning electron microscopy (FE-SEM), contact angle measurements, and electrochemical tests. Comprehensive evaluation by the Technique for Order Preference by Similarity to Ideal Solution (TOPSIS) method identified optimal conditions of 1.5 Pa pressure, 150 W radio frequency (RF) power, −250 V bias voltage, and 60 min deposition, yielding dense, uniform films with a corrosion current density of 1.61 × 10−6 A·cm−2 and a contact angle of 106.36°, indicative of lotus leaf-like hydrophobicity. This work enriches the theoretical understanding of a-C film process optimization, offering a practical approach for modifying fuel cell bipolar plates to support hydrogen energy applications.