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August 22, 2024Open Access

Low Resistivity Aluminum Doped Layers Formed Using High Dose High Temperature Implants and Laser Annealing

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FMFulvio MazzamutoZCZeinab ChehadiFRFabien Rozé

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Mazzamuto et al. (2024) studied this question.

synapsesocial.com/papers/68e5b5f4b6db64358754ecc2https://doi.org/10.4028/p-7t0wv7
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