August 8, 2024OpticaOpen Access

Efficient mass manufacturing of high-density, ultra-low-loss Si3N4 photonic integrated circuits

View Full Paper

Ask AI

Bookmark

Authors

XJXinru JiBeijing Jiaotong University RWRui Ning WangApplied Photonics (United Kingdom)YLYang LiuWuhan National Laboratory for Optoelectronics

Discussion

Member takes

Implication

Experimental study demonstrates scalable fabrication of low-loss silicon nitride photonic circuits, indicating high-yield manufacturing for advanced photonics.

Key Points

Silicon nitride optical waveguides achieve propagation loss down to 1.4 dB/m at 1550 nm, enabled by deep substrate trenches that eliminate film cracking.
Fabrication using a DUV-based subtractive method incorporates rapid thermal annealing alongside secondary ion mass spectrometry to clear metal impurities.
This scalable manufacturing approach supports high-yield production of tightly confined optical devices for photonic computing, quantum systems, and lasers.

Cite This Study

Ji et al. (2024) studied this question.

synapsesocial.com/papers/68e5cfeeb6db643587565f8d https://doi.org/10.1364/optica.529673

View Full Paper

Ask AI

Bookmark

Implication

Experimental study demonstrates scalable fabrication of low-loss silicon nitride photonic circuits, indicating high-yield manufacturing for advanced photonics.

Efficient mass manufacturing of high-density, ultra-low-loss Si3N4 photonic integrated circuits

Discussion

Member takes

Implication

Key Points

Cite This Study

Efficient mass manufacturing of high-density, ultra-low-loss Si3N4 photonic integrated circuits

Discussion

Member takes

Implication

Key Points

Cite This Study

Also Consider

Also Consider