Organometallic tin-oxo-hydroxo cage compounds offer a promising photoresist platform for extreme ultraviolet photolithography (EUVL). Their reactivity is dominated by the facile breaking of the tin-carbon bonds upon photon or electron irradiation. As the cage is dicationic, it exists as a complex with anions for charge compensation. In the present work, we explore the
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Evrard et al. (2024) studied this question.
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