This study demonstrates enhanced solubility contrast in photoresists using CO2 and H2O, indicating new pathways for lithography optimization.
The tin-oxo cage is a promising photoresist due to tin's large extreme ultraviolet (EUV) photon cross-section and small size. CO2 and H2O play a crucial role in increasing the solubility contrast of tin-oxo cages in deep ultraviolet (DUV) and EUV lithography. However, the internal reaction mechanisms remain largely unknown. This work systematically investigated the cleavage of carbon–tin bonds in tin-oxo cages by density functional theory (DFT) upon diverse irradiation (DUV and EUV). Subsequently, the interactions of the resulting intermediates with CO2/H2O (or their hybrid) were examined, revealing that hydroxyl compounds (from the dissociation of H2O) serve as pivotal precursors to trigger new cross-linking reactions (forming Sn–O–Sn and Sn–OCO–Sn products) and enhance the solubility switch. These theoretical results provide insight into the atomic-scale mechanisms of small molecules improving photoresist properties, offering new perspectives for the design and optimization of novel photoresist materials.
No takes yet. Share an insight, caveat, or question.
Yang et al. (2025) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: