Extreme Ultraviolet induced reactions of tin-oxo cage photoresists

Key Points

• This research aims to explore the reactions of tin-oxo cage photoresists when exposed to extreme ultraviolet light, focusing on performance enhancements.
• Examined the chemical reactions of tin-oxo cages under extreme ultraviolet exposure.
• Evaluated the performance characteristics, such as resolution and sensitivity, of the photoresists.
• Analyzed patterning fidelity using advanced lithographic techniques.
• Tin-oxo cage photoresists showed improved resolution and patterning fidelity under extreme ultraviolet exposure.
• Significant enhancements in sensitivity were observed, indicating potential for future technology nodes.