The precise characterization of thin layers in microelectronics or related fields is more and more challenging as the targeted thicknesses are decreasing into the nanometer range. Combined XRR-GIXRF analysis is a powerful technique that combines the advantages of the elemental sensitivity of X-ray fluorescence with the thickness and density sensitivity of X-ray reflectivity. This method is performed in a reference-free mode which relies on the precise knowledge of some physical quantities.
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Ménesguen et al. (2024) studied this question.
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