Deposition of thin films on hybrid-polymer 3D micro-optics using atomic layer deposition

Anti-reflective (AR) coatings are widely utilized to minimize reflections from optical components. Laser direct writing (LDW) is employed to fabricate complex and multi-level micro-optical elements, such as micro-triplets. Conventional physical vapor deposition methods are insufficient to produce conformal coatings on complex shape and stacked substrates. The atomic layer deposition (ALD) technique offers a promising solution for achieving conformal coatings on free-form components. In this work, we demonstrate the deposition of an AR coating by ALD on LDW-fabricated microstructures and micro-lenses. The ALD-deposited AR coating successfully reduced reflection from 3.3% to 0.1% at 633 nm for one surface of SZ2080.