Experimental evaluation demonstrates ultra-fast growth of conformal oxide films in a spatial atomic layer deposition reactor, indicating scalable manufacturing for optical coatings.
In this work, we present a new-generation atomic layer deposition (ALD) technology that revolutionizes the production of conformal optical coatings: the spatial ALD. In spatial ALD, the substrate is rotated across successive process zones to achieve ultra-fast, high-precision and conformal thin film deposition. We present our latest results obtained with our novel C2R spatial ALD system, including the fabrication of SiO2, Ta2O5, Al2O3 and TiO2 with deposition rates reaching > 1 µm/h. We also show that these materials exhibit low surface roughness (<1 Å RMS), low optical loss (<10 ppm @ 1064 nm) and excellent uniformity (< 2% over 200 mm)
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Rönn et al. (2024) studied this question.
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