In this work, we studied the effect of the different thickness buffer layer on the electrical characteristics of InZnO (IZO) transistors. We found that when a 20nm layer of indium‐aluminum‐zinc oxide (IAZO) was added as the buffer layer between S/D electrodes and the active layer, the IZO transistor exhibited optimum electrical performance, with a high on/off drain current ratio of 2.61 ×10 7 , the field‐effect mobility (μ FE ) of 15.75 cm 2 /Vs, the subthreshold swing (SS) of 129.85 mV/decade, and the turn‐on voltage (V ON ) of ‐0.4 V.
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Xiong et al. (2024) studied this question.
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