Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing

Displacement Talbot Lithography (DTL) has emerged as a viable technology that relies on the proven photolithography approach of the semiconductor industry while offering a specific, low-cost solution for large area printing of periodic structures of the kind required on waveguides. Electronic Design Automation (EDA) tools are necessary for standard projection lithography approaches, and now can be used to understand DTL interactions with waveguide designs. Here, we present the first results from the development of a complete design and optimization approach that facilitates fabrication of waveguide devices with optimum processing conditions and targeted device performance.