Multi-height pillars replication from a grayscale resist master by nanoimprint process

Nanoimprint Lithography (NIL) remains a versatile technology for replicating optically functional patterns. However, height and roughness conservation over large areas during replication, remains a challenge. In order to identify UV-NIL process capabilities, this study propose to validate the replication of multi-height pillars present on the resist master manufactured by grayscale lithography. Multiple measurement were performed on all pillars before and after replication using profilometry and Atomic Force Microscopy (AFM) to evaluate height and roughness of all patterns. This achievement represents a novel approach to understanding and identifying the capabilities of the UV-NIL process.