Two-photon polymerization lithography as a mastering tool for nanoimprint lithography

UV-based nanoimprint lithography (NIL) is a micro- and nano-replication technology which has emerged as a highly versatile and resolution-capable replication technology which is able to replicate complex structures in a single processing step. A critical aspect of the NIL process chain is the availability of high-precision master structures, which are essential for fabricating NIL stamps. To address this, we use two-photon polymerization (2PP), a high-precision 3D printing technology based on nonlinear 2-photon absorption (2PA) which enables the fabrication of NIL masters with submicron resolution. This study demonstrates the synergistic integration of 2PP, NIL and polydimethylsiloxane (PDMS) casting for manufacturing of microstructured surfaces with the goal of improving hemocompatibility in left ventricular assist devices (LVAD).