Elastic and inelastic cross section of tin ions in an extreme ultraviolet lithography source

Extreme ultraviolet (EUV) lithography sources generate energetic tin ions. Accurate modeling of ion transport relies on knowledge of elastic scattering cross-section of tin ions against molecular hydrogen. This work uses available theoretical knowledge of elastic scattering found in literature, quantum chemistry modeling of the interaction potential between tin and hydrogen, and experimental scattering measurements of a tin ion beam to calculate the cross-section values. Furthermore, semi-classical collision calculations were used to calculate collision induced dissociation cross sections of tin ions and molecular hydrogen.