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November 30, 2025Angewandte Chemie International Edition

Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography

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Authors

MLMing‐Bu LuoECEr‑Xia ChenJWJuan Wang

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Overview

Demonstrates enhanced solubility and stability in chalcogenidometalate clusters, indicating potential for nanopatterning using electron beam lithography.

Key Points

  • OA-X clusters demonstrate unprecedented solubility and stability, enabling their use in nanopatterning applications.
  • Utilizing electron beam lithography, OA-X-based films achieve 50 nm line patterning, highlighting cluster chemistry advancements.
  • This approach employs polyamine coordination and butyltin termination to synthesize novel chalcogenidometalate clusters.
  • The study bridges molecular precision with nanolithography design, implying significant advancements for EUV technologies.

Cite This Study

Luo et al. (2025) studied this question.

synapsesocial.com/papers/692b9d9a1d383f2b2a379fc2https://doi.org/10.1002/anie.202523993
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography2025
  2. 2Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography2025
  3. 3Outside Front Cover: Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography2026
  4. 4Pseudotetrahedral Organotin-Capped Chalcogenidometalate Supermolecules with Optical Limiting Performance2024 · 8 citations
  5. 5Access of Adamantane-Type Organotin(IV) Heterochalcogenide Clusters2026