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November 30, 2025Angewandte Chemie

Neutral Octa‐Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for Nanolithography

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Authors

MLMing‐Bu LuoECEr‑Xia ChenJWJuan Wang

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Overview

Combination of polyamine and butyltin strategies improved stability and EBL performance for nanopatterning with chalcogenidometalate clusters.

Key Points

  • Octa‐adamantane clusters showed improved solubility and stability in solvents, enhancing their application in nanolithography.
  • Electron beam lithography enabled 50 nm line patterning with the OA‐Se clusters, highlighting their superior sensitivity.
  • The innovative use of polyamine coordination and butyltin termination diversified the cluster geometries beyond conventional designs.
  • This work underscores the potential for charge-neutral clusters in advanced materials for EUV nanolithography.

Cite This Study

Luo et al. (2025) studied this question.

synapsesocial.com/papers/692b9da91d383f2b2a37a49dhttps://doi.org/10.1002/ange.202523993
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