Impact of bottom electrode materials on the crystallographic orientation and ferroelectric performance of Al 0.8 Sc 0.2 N thin films

Xiaoxia Gao

doi:10.1039/d5nr03449c

January 1, 2025Nanoscale

Impact of bottom electrode materials on the crystallographic orientation and ferroelectric performance of Al 0.8 Sc 0.2 N thin films

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Key Points

Nucleation enhances ferroelectric performance in thin films, emphasizing interface importance and providing insight into behavior.
Key metric highlighted is the role of crystallographic orientation in determining the behavior of thin films during nucleation.
Assessment investigates how different electrode materials influence microstructures in ferroelectric thin films.
Findings suggest enhanced control over ferroelectric properties through bottom electrode material selection.

Implication

This analysis reveals improved crystallographic orientation in thin films, suggesting interface role in nucleation and ferroelectric behavior.

Abstract

Al 0.8 Sc 0.2 N films exhibit substrate-dependent microstructures yet follow a unified polarization switching mechanism. The ferroelectric nucleation mechanism at a single interface is provided and emphasizes the role of the interface in nucleation.

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Cite This Study

Xiaoxia Gao (2025) studied this question.

synapsesocial.com/papers/6930dc92ea1aef094cca29d5 https://doi.org/10.1039/d5nr03449c

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Impact of bottom electrode materials on the crystallographic orientation and ferroelectric performance of Al 0.8 Sc 0.2 N thin films

Key Points

Implication

Abstract

Discussion

Cite This Study

Impact of bottom electrode materials on the crystallographic orientation and ferroelectric performance of Al 0.8 Sc 0.2 N thin films

Key Points

Implication

Abstract

Discussion

Cite This Study

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