The Formation Law of Surface Profile in Fused Silica During Continuous-Wave CO2 Laser Processing

Although CO2 laser polishing of fused silica surfaces is considered a promising advanced processing technology, its application remains fundamentally limited by low- to mid-frequency waviness and surface figure errors. To address the critical need for enhanced performance of laser-processed fused silica components, this study investigated the formation law of the surface profile during CO2 laser processing. Experimental results revealed the formation law governing the influence of processing parameters on surface morphology. A multivariate regression model was established to quantitatively correlate processing parameters with surface profile evolution, enabling prediction of profile errors with less than 5% deviation. Furthermore, an optimization strategy was proposed by introducing an annealing process, which reduced the surface profile error by more than 50% (from 56.94 μm to 23.18 μm). These findings provide both a theoretical basis and process guidance for the low-defect fabrication of fused silica components in high-power laser applications.