Abstract Owing to the exceptional optoelectronic properties, metal halide perovskites have emerged as leading semiconductor materials for next-generation display technologies, providing perovskite light-emitting diodes (PeLEDs) great potential for high-quality color displays with a wide color gamut and pure color emission. Although laboratory-scale PeLEDs have achieved near-theoretical efficiencies, challenges such as achieving uniform large-area films, improving material stability, and enhancing patterning precision remain barriers to commercialization. This review presents a systematic analysis of scalable manufacturing and precision patterning strategies for PeLEDs, focusing on their applications in large-area lighting and full-color displays. Fabrication methods are categorized into film deposition techniques (spin-coating, blade-coating, and thermal evaporation) and patterning strategies, including top-down (photolithography, laser/e-beam lithography, and nanoimprinting) and bottom-up (patterned crystal growth, inkjet printing, and electrohydrodynamic jet printing) approaches. In this review, we discuss the advantages and limitations of each strategy, highlight current challenges, and outlook possible pathways towards scalable, high-performance PeLEDs for advanced optoelectronic applications.
Liu et al. (Mon,) studied this question.