Magnetic-field-induced insulator-metal transition in V1-xWxO₂ (x = 0.06, 0.12) in magnetic fields of up to 500 T

The low-temperature insulator phase is found to be completely suppressed by ultrahigh magnetic fields of 500 T and transformed to the metallic phase in a V1-xWxO2 (x = 0.06) thin film, which has a slightly lower metal-insulator transition temperature (TMI) than that of the film reported in the previous ultrahigh magnetic field experiment [1,2]. It is also found that the insulator phase is more robust against a magnetic field for a highly W-doped film (x = 0.12), suggesting a different origin of the insulator phases between x = 0.06 and 0.12.