What does this research mean for the field?

Atomic layer deposition of aluminum molybdenum oxide films using trimethylaluminum and molybdenum dichloride dioxide results in linear growth rates of 3.79 Å/cycle and 3.94 Å/cycle, respectively, at 180°C. Novelty: ClaimNovelty.METHODOLOGICAL. Consensus alignment: ConsensusAlignment.NEUTRAL.

What question did this study set out to answer?

The aim is to develop a method for synthesizing aluminum molybdenum oxide films using atomic layer deposition.

March 1, 2026Russian Journal of Inorganic Chemistry

Atomic Layer Deposition of Aluminum Molybdenum Oxide Films Using Trimethylaluminum and Molybdenum Dichloride Dioxide

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The aim is to develop a method for synthesizing aluminum molybdenum oxide films using atomic layer deposition.
Utilized cyclic reactions of trimethylaluminum and molybdenum dichloride dioxide.
Studied the impact of water vapor in the ALD cycle.
Measured film growth using quartz crystal microbalance at 180°C.
Linear growth observed at rates of 3.79 Å/cycle for TMA–MoO2Cl2 and 3.94 Å/cycle for TMA–H2O–MoO2Cl2.
Films displayed an amorphous structure with a density of ~3.7 g/cm3.
Root-mean-square roughness ranged between 10–12 Å.

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Implication

This research demonstrates the growth of aluminum molybdenum oxide films, suggesting significant implications for material development.

Cite This Study

Maksumova et al. (2025) studied this question.

synapsesocial.com/papers/69a3d89aec16d51705d2f911 https://doi.org/10.1134/s0036023625603848

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Atomic Layer Deposition of Aluminum Molybdenum Oxide Films Using Trimethylaluminum and Molybdenum Dichloride Dioxide

Key Points

Discussion

Implication

Cite This Study

Atomic Layer Deposition of Aluminum Molybdenum Oxide Films Using Trimethylaluminum and Molybdenum Dichloride Dioxide

Key Points

Discussion

Implication

Cite This Study

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