What question did this study set out to answer?

This research aims to identify suitable ruthenium compounds for advanced interconnect applications.

March 15, 2026Journal of Materials Chemistry C0 citationsOpen Access

First-principles high-throughput screening of ruthenium compounds for advanced interconnects

GMGyungho MaengIncheon National University SLSubeen LimIncheon National University BSBonggeun ShongSeoul Semiconductor (South Korea)

Key Points

This research aims to identify suitable ruthenium compounds for advanced interconnect applications.
Conducted high-throughput screening of various ruthenium compounds
Evaluated resistivity changes compared to copper
Analyzed the potential performance benefits in interconnect dimensions
Identified specific ruthenium compounds with lower resistivity than copper
Demonstrated improved electrical performance metrics for selected compounds
Suggested optimal candidates for further development in semiconductor applications

Abstract

As interconnect dimensions continue to shrink, the industry-standard copper faces a critical increase in resistivity, presenting a significant hurdle to overall device performance. To overcome this limitation, this work investigates...

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