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The research aims to evaluate the performance of a titanium hollow cathode for discharge production and its efficiency in sputtering TiO2.

April 1, 2026Open Access

Pressure dependence of current-voltage characteristics of a thin hole hollow cathode

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An experiment examines how pressure affects current-voltage behavior in a Ti hollow cathode, revealing its sputtering capabilities.

The research aims to evaluate the performance of a titanium hollow cathode for discharge production and its efficiency in sputtering TiO2.
Designed a Ti hollow cathode with a 0.7 mm aperture
Tested performance in argon gas (Ar) discharge from 10 to 100 Pa
Measured current-voltage characteristics under different pressures
Assessed sputtered atom flux rates for TiO2 preparation
Durable against high-voltage breakdown
Sustained Ar discharge across the tested pressure range
Generated sputtered atom flux at approximately one monolayer per second
Demonstrated potential as a sputter source for TiO2 film fabrication

Montallana et al. (2024) studied this question.

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