Reactive sputter deposition of TiNxfilms, simulated with a particle-in-cell/Monte Carlo collisions model

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The physical processes in an Ar/N 2 magnetron discharge used for the reactive sputter deposition of TiN x thin films were simulated with a 2d3v particle-in-cell/Monte Carlo collisions (PIC/MCC) model. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fractions were calculated and validated with mass spectrometric measurements. With this PIC/MCC model, the influence of N 2 /Ar gas ratio on the particle densities and fluxes was investigated, taking into account the effect of the poisoned state of the target.