This is the authors' abstract. We don't add key points for this paper.
The buffer layer in AlGaN channel HEMTs to suppress the off-state drain leakage current is investigated. By employing an AlN for the buffer layer in Al0.39Ga0.61N/Al0.16Ga0.84N HEMTs, the off-state drain leakage current was sufficiently suppressed and the breakdown voltage was enhanced. It was considered that employing the AlN for the buffer layer is important for extracting the superior material properties of the AlGaN in the channel layer.
Answers are grounded in this paper and cite their sources.
No takes yet. Share an insight, caveat, or question.
Nanjo et al. (2009) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: